We are on a mission to commercialize particle accelerator technologies for critical U.S. economic and national security applications.
Our work is driven by the belief that the United States must regain and sustain leadership in semiconductor manufacturing, starting with one of the industry’s most important chokepoints: EUV Lithography.
To that end we have developed a new EUV Free Electron Laser (FEL) lithography light source to replace the current Laser-Produced Plasma (LPP) source, which is nearing its physical limits.
Our systems will significantly enhance the technological roadmap of ASML – the undisputed global leader in EUV lithography systems – transform semiconductor fab capabilities and dramatically reduce capital and operating expenses.
